metal deposition

metal deposition

Англо-русский строительный словарь. — М.: Русский Язык. . 1995.

Смотреть что такое "metal deposition" в других словарях:

  • Déposition (chimique) — Dans le domaine de la chimie de l atmosphère ou de l évaluation environnementale, la notion de « déposition » ( d aérosols, vapeurs ou de particules aéroportées) est utilisé pour décrire les phénomènes conduisant à la formation d un… …   Wikipédia en Français

  • Metal dusting — is a catastrophic form of corrosion that occurs when susceptible materials are exposed to environments with high carbon activities. [1] The corrosion manifests itself as a break up of bulk metal to metal powder. The suspected mechanism is firstly …   Wikipedia

  • Metal matrix composite — A metal matrix composite (MMC) is composite material with at least two constituent parts, one being a metal. The other material may be a different metal or another material, such as a ceramic or organic compound. When at least three materials are …   Wikipedia

  • Metal-induced gap states — In bulk semiconductor band structure calculations, it is assumed that the crystal lattice (which features a periodic potential due to the atomic structure) of the material is infinite. When the finite size of a crystal is taken into account, the… …   Wikipedia

  • Déposition sous vide — Dépôt sous vide Sommaire 1 But 2 Principe 3 Contraintes particulières 4 Avantages et inconvénients …   Wikipédia en Français

  • Gas metal arc welding — RMD redirects here. RMD may also refer to IRA Required Minimum Distributions. Gas metal arc welding …   Wikipedia

  • Plasma Enhanced Chemical Vapour Deposition — Plasma Enhanced Chemical Vapour Deposition, PECVD or sometimes PCVD, is the process by which chemicals are deposited onto a substrate using a Radio Frequency (RF) Plasma to split the precursors into active ions.TheoryPrecursor chemical enter the… …   Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

  • Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… …   Wikipedia

  • Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia


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